Work

Atmospheric Switching between Etching and High-Quality Fluorination of Graphene by XeF2

Year: 2025

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.5c04262

Authors: Xingheng Yan, Xiangzhe Zhang, Bowen Lv, Yichao Zou, Mengya Zhang, Haitao We, Tongcheng Yu, Junhao Cai, Sen Liu, Junsheng Li, Xingui Zhou, Yaping Yang

Institutions: National University of Defense Technology, Space Engineering University, Sun Yat-sen University

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: China National Funds for Distinguished Young Scientists

Award: G8780378065

OpenAlex ID: W4410368129

FWCI: 0.62

Cites: 37

Cited by: 3

Related to: 10