Work

Direct-patterning SnO 2 deposition by atomic-layer additive manufacturing

Year: 2025

Type: article

Abstract: The ALD precursor tetrakis(dimethylamido)tin and water are exploited towards the atomic-layer additive manufacturing (ALAM) of SnO 2 lines.

Source: Materials Advances

DOI: 10.1039/d5ma00182j

Authors: Sonja Kürten, Kimia Hashemizadeh, Mingjian Wu, Johannes Will, Ivan Kundrata, Erdmann Spiecker, Julien Bachmann

Institutions: Friedrich-Alexander-Universität Erlangen-Nürnberg, Institute of Electrical Engineering of the Slovak Academy of Sciences

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $1,962

Funder: Deutsche Forschungsgemeinschaft

Awards: G1386772601, G967606689

OpenAlex ID: W4410378053

FWCI: 0.693

Cites: 11

Cited by: 3

Related to: 10