TDDB Characterization of High-k Gate Dielectric on a Sub-nanosecond Timescale
Year: 2025
Type: conference-paper
Authors: Matthew Drallmeier, Elyse Rosenbaum
Institution: University of Illinois Urbana-Champaign
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4410394192