Elimination of space charge effects in passivation films: the key to substantially enhancing the dielectric properties of tantalum oxide films
Year: 2025
Type: article
Source: Journal of Materials Chemistry C
DOI: 10.1039/d5tc01178g
Authors: Jiping Zhao, Jingjing Liu, Xiaoxuan Zhu, Beibei Wang, Hongbing Cai, Jingsong Xu
Institution: Jiangsu Normal University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G4620894447
OpenAlex ID: W4410412519