Work

Surface Reconstruction for Enhancing the Overlay Modeling Optimization Procedure in Photolithography Processes

Year: 2025

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2025.3570904

Authors: Aris Magklaras, Christos Gogos, Panayiotis Alefragis, Alexios Birbas, Sila Guler

Institutions: University of Patras, University of Ioannina, University of Peloponnese, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410427469

FWCI: 0.907

Cites: 30

Cited by: 4

Related to: 10