Work

Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide

Year: 2025

Type: article

Source: Tribology International

DOI: 10.1016/j.triboint.2025.110803

Authors: Zirui Wang, Yuguang Zhu, Ronghao Ren, Tianyu Zhang, Yang Peng, Yongguang Wang, Xiaolong Lu, Chuanyang Wang

Institutions: Soochow University, Xi’an Jiaotong-Liverpool University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Jiangsu Province Postdoctoral Science Foundation, National Natural Science Foundation of China, China Postdoctoral Science Foundation, Postdoctoral Science Foundation of Jiangsu Province

Awards: G206501889, G3202993946, G3352796042, 弱钝化薄膜设计及碱性下铝低压力平坦化材料高效去除机制, G4990595071, G6838414817

OpenAlex ID: W4410432118

FWCI: 4.096

Cites: 59

Cited by: 17

Related to: 10