Work

Effect of reactive ion etching on the photoluminescence intensity of nitrogen-vacancy color centers in microwave plasma chemical vapor deposition diamond films

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004405

Authors: Yuan Liu, Feng Xu, Chenxukun Lou, Yue Yan, Xianqing Shi, Wenxuan Zhao, Wang Ma, Hailong Zhang, Dunwen Zuo

Institution: Nanjing University of Aeronautics and Astronautics

Language: English

Topic: Diamond and Carbon-based Materials Research

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G6473655984

OpenAlex ID: W4410600550

FWCI: 0.207

Cites: 49

Cited by: 1

Related to: 10