Work

The influence of pulsed negative bias on the properties of silicon oxide barrier coatings prepared by microwave PECVD technology

Year: 2025

Type: article

Source: Journal of Physics D Applied Physics

DOI: 10.1088/1361-6463/addbea

Author: Yin Lianhua

Institution: Shanghai Publishing and Printing College

Language: English

Topic: Plasma Applications and Diagnostics

Subfield: Radiology, Nuclear Medicine and Imaging

Field: Medicine

Domain: Health Sciences

Open Access status: closed

OpenAlex ID: W4410610955

FWCI:

Cites: 23

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Related to: 10