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Optimization Epitaxy Process to Reduce Hotspot Problem

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010464

Authors: Cheng Kangjian, Li Yong, Huang Jingyan, Lew Wen Siang

Institutions: GlobalFoundries (Singapore), Nanyang Technological University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410770237

FWCI:

Cites: 9

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Related to: 10