Work

eFUSE and IDDQ Process Window Enhancement Through CoSi RTA Optimization

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010771

Authors: Adukkadukkam Dineshan, Low Si Yien, Islam Mohd Nurul, Tang Jialiang, Cheng Gong

Institution: GlobalFoundries (Singapore)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4410770330

FWCI:

Cites: 6

Cited by:

Related to: 10