Work

Eliminating Half Wafer Shading Defects in Lithography Track Tools using Open Shutter Method

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010583

Authors: Kinjal Valendra, Hyunjun Ha, Dung Nguyen, Jean R. Fakhoury, Shu Jin Low

Institution: GlobalFoundries (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410770355

FWCI: 2.32

Cites: 4

Cited by: 1

Related to: 10