Work

The utilization of mathematical trends to characterize equipment manipulation at process temperature for leveling a CVD film

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010297

Authors: Chris Schoeb, Robert Boyne, Omkar Muglikar

Institution: Micron (United States)

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410770358

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