Work

Effect of plasma RF state 0 pulsing power on micro-loading and cross-wafer uniformity in high aspect ratio contact etch

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010794

Authors: Jeff J. Ye, Bill Crandley, Varun Sabramanian, Ye Jia, Chi Tsang, Mike Frachel, David MacMahon

Institution: Micron (United States)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410770950

FWCI:

Cites: 5

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Related to: 10