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WEE Residue Elimination for Cross-Link Prone Positive Tone DUV Photoresists

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010654

Authors: Si Hao Bennett Lim, Akshai Viswanathan, Houdong Liu, Vinod Xavier

Institution: GlobalFoundries (Singapore)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410770981

FWCI:

Cites: 5

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Related to: 10