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The Process Challenges from Silicon Rich Polymers: A Case Study on Yield Loss Induced by Consecutive Etch and Stripping Processes

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010456

Authors: XiaoBin Wu, Belinda Ng, Daiyu Huang, Shashank Juyal

Institution: GlobalFoundries (Singapore)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410772002

FWCI:

Cites: 3

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Related to: 10