Work

Rapid Probe Microscope (RPM) Technology Advances High-Speed AFM Systems for Next-Generation Semiconductor Metrology

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010280

Authors: Lei Feng, Vishal Panchal, Richard Thorogate, James Robinson, Andrew Humphris

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410772148

FWCI: 2.358

Cites: 3

Cited by: 1

Related to: 10