Work

Silicon-Germanium (SiGe) Epitaxial Growth for Enhanced Device, Yield, and Uniformity

Year: 2025

Type: conference-paper

Source: Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

DOI: 10.1109/asmc64512.2025.11010780

Authors: Yuchen Du, Vitor Rossi Vulcano, Yao Yao, Wen Zhi Gao, Wei Ma

Institution: GlobalFoundries (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410779740

FWCI:

Cites: 6

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Related to: 10