Work

Characteristics of inductively coupled plasma radio frequency ion sources in commercial ion implanters

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004560

Authors: Jong Jin Hwang, Hyo Jun Sim, Seung Jae Moon

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Korea Institute for Advancement of Technology

Award: G792347380

OpenAlex ID: W4410780935

FWCI:

Cites: 28

Cited by:

Related to: 10