Optical Lithography Proximity Correction using Machine Learning and Richardson-Lucy Deconvolution
Year: 2025
Type: conference-paper
Authors: Tanmay Wani, Bikash Dev Choudhury
Institutions: University of Mumbai, Indian Institute of Technology Bombay
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4410855147