Work

Comparative study on the influence mechanism of He/Ar/N 2 plasma treatments on the high tensile stress of a multilayer silicon nitride film

Year: 2025

Type: article

Abstract: Silicon nitride films with high tensile stress have great application potential in the strained silicontechnology field.

Source: RSC Advances

DOI: 10.1039/d5ra02111a

Authors: Jianping Ning, Zhen Tang, Yue Sun, Chunjie Niu, Jichi Yang, Dayu Zhou

Institutions: Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion and Electron Beams

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $1,042

OpenAlex ID: W4410864285

FWCI: 0.657

Cites: 38

Cited by: 2

Related to: 10