Work

Design, Fabrication, and Process Optimization of Low-Voltage Super Junction TG MOSFET

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018030

Authors: Hongzhou Lu, Zhiyuan Hu, Guoji Qiu, Tao Xu, Qing Liu, Dawei Bi, Zhengxuan Zhang

Institution: Shanghai Institute of Microsystem and Information Technology

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4410986408

FWCI: 2.358

Cites: 10

Cited by: 1

Related to: 10