Work

Reduction of Wafer Backside Aluminum Contamination for Harp STI Process

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017932

Authors: Zhuo Xiong, Yingjie Chen, Qili Lu, Chenyu Wang

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410986509

FWCI:

Cites: 3

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Related to: 10