Work

Modeling of NTD Resist Shrinkage Based on Spring-Mass System

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018025

Authors: Delong Yao, Lisong Dong, Yayi Wei

Institutions: Chinese Academy of Sciences, Institute of Microelectronics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences, Fundamental Research Funds for the Central Universities

OpenAlex ID: W4410986567

FWCI:

Cites: 1

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Related to: 10