Work

Investigating the etch Performance of Zirconium-Based Photoresist for Direct Silicon Oxide Etching

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017874

Authors: Ahmad Hassan Siddique, Zewen Liu, Yang Hu, Hong Xu, Huaqiang Wu, Mark Neisser

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410986789

FWCI:

Cites: 12

Cited by:

Related to: 10