Work

The PMOS Silicon Recess Process Control With Evolution of Trench Morphology

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017878

Authors: Fan Yu, Haiyun Zhu, Zhongwei Jiang

Institution: NAURA (China)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410986876

FWCI:

Cites: 3

Cited by:

Related to: 10