Work

LWR Improvement in the Advanced Process Node Involved in 193nm Photoresist Treatment

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017936

Authors: Guangzhao Yuan, Jing Wang, Litian Xu, Zhongwei Jiang, Aishu Sang, Lianfu Zhao, Zheng Ji

Institution: NAURA (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410986903

FWCI:

Cites: 7

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Related to: 10