Work

The Etching of SiO2/Mo-MoN/SiO2/TiN Stacks in an Inductively Coupled Plasma System

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017959

Authors: Jiahui Sun, Linjie Hou, Yaqiong Li, Baodong Han, Zhonghua Jin, Hongbo Sun, Chao Zhao

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410986994

FWCI:

Cites: 4

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Related to: 10