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An Investigation into the Optimization of Photolithography Process for Silicon Nitride Devices on the fab's 12-inch Production Line

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017872

Authors: Poyi Liu, Kangkang Zhang, Yongyu Wu, Wenzhang Fang, Huiyun Jiang

Institution: Zhejiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4410987015

FWCI:

Cites: 1

Cited by:

Related to: 10