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Overcoming Small Sample Size Challenges In Lithography Process Window Analysis Through DCGAN-Based Augmentation

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017839

Authors: Zeyang Chen, Shuzhe Cao, Pan Liu, Tianhao Huang, Jianming Wu, Guodong Zhou

Institution: Zhejiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987065

FWCI:

Cites: 10

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Related to: 10