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Study on Process Adjustments and APC for Precise Thickness Control of Embedded Semi-Floating Gates

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017867

Authors: Changfeng Wang, Yanfei Ma, Xueli Zhang, Shiling Yang

Institution: Shanghai Huali Microelectronics (China)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987228

FWCI:

Cites: 2

Cited by:

Related to: 10