Work

Depth Uniformity of Silicon and Dielectric Trenches Etching for the Burried Wordline of Novel Memory

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018000

Authors: Teng Zhang, Hui Qin, Litian Xu, Zhongwei Jiang, Wang Jing

Institution: NAURA (China)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987264

FWCI: 2.3

Cites: 4

Cited by: 1

Related to: 10