Work

Comparison of 40MHz and 60MHz HF Frequencies in Dual-Frequency CCP for Low-K AIO Process

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018049

Authors: Weiming Liu, Bojia He, Hui Yang, Qiyao You, Chao Sun

Institution: Advanced Micro-Fabrication Equipment (China)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987274

FWCI:

Cites: 3

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Related to: 10