Chamber Conditions Control with Waferless Auto Clean Strategy in BEOL Aluminum Metal Etching Process
Year: 2025
Type: conference-paper
Authors: Guo-Hui Jia, Chang-Sheng Wei, Li-Tian Xu
Institution: NAURA (China)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4410987357