Work

SiC Etch with Inductively Coupled Plasma for Power Device Applications

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017908

Authors: Haiyang Lv, Shizheng Li, Yanzhi He

Institution: Advanced Micro-Fabrication Equipment (China)

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4410987402

FWCI:

Cites: 5

Cited by:

Related to: 10