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An Approach to Improve Distortion with High-Aspect-Ratio Cryogenic Etching Using BORON-Containing Gases

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017823

Authors: Yue Wei, Vina Xu, Zhiping Shao, Peter Zhu, Kai Zhang

Institution: Advanced Micro-Fabrication Equipment (China)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987481

FWCI:

Cites: 2

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Related to: 10