Work

The Method of OPC Correction for Narrow Neck Structures in LDD Layer

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018016

Authors: Qing Li, Yue Wang, Yueyu Zhang

Institution: Shanghai Huali Microelectronics (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4410987609

FWCI:

Cites: 2

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Related to: 10