Work

Simulation-Driven Optimization of STI Etching: A Systematic Approach to Defect Reduction

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017999

Authors: Jianming Guo, Xiaoming Shi, Hao Bai, Dong Ni, Dawei Gao

Institution: Zhejiang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

OpenAlex ID: W4410987785

FWCI:

Cites: 4

Cited by:

Related to: 10