Work

Unexpected Enhancement of Aluminum Etching Rate by Increased Nitrogen Concentration in Semiconductor Manufacturing

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11017824

Authors: Quanzhi Long, Lei Yang, Xuqing Zhang, Wenzhang Fang, Dawei Gao

Institution: Zhejiang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Research and Development

OpenAlex ID: W4410987873

FWCI:

Cites: 4

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Related to: 10