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Symmetry and Anisotropy in Wafer Deformation: Their Effect on Alignment Signal Degradation

Year: 2025

Type: conference-paper

DOI: 10.1109/cstic64481.2025.11018023

Authors: Jibin He, Pan Liu, Jianming Wu, Dawei Gao, Guodong Zhou

Institution: Zhejiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Zhejiang University, Research and Development

OpenAlex ID: W4410988010

FWCI:

Cites: 2

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Related to: 10