Work

High Aspect Ratio, Superconducting Vacuum Gap Capacitor NEMS with Plate Distances Down to 32 nm

Year: 2025

Type: article

Abstract: Fabrication of aluminium vacuum gap capacitor based nano electromechanical systems (NEMS) is investigated, where the bottom electrode is fixed, and the top electrode is free to move. To avoid collapse of the top electrode, simultaneous oxidation of both sides of the top electrodes is ensured by the deposition of silicon protection layer without breaking vacuum, intended to be removed with the release process of the membrane with XeF2 gas. Furthermore, the vertical stress gradient is controlled by optimizing the sputter deposition parameters for the aluminium top electrode to 50 W and 3 µbar for 100 nm. These techniques resulted in wafer‐level high‐yield fabrication of capacitors with radii between and . A cryostat at 400 mK and an integrated piezoactuator are used to prove electromechanical coupling.

Source: Advanced Materials Technologies

DOI: 10.1002/admt.202401909

Authors: Ioan Ignat, Daniel Platz, Ulrich Schmid

Institution: TU Wien

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: hybrid

Estimated APC paid: $4,680

Funders: European Commission, Technische Universität Wien, Technische Universität Wien Bibliothek, H2020 European Research Council