Work

ITO Films Deposited on Silicon by CVD Method

Year: 2025

Type: article

Source: Surface Engineering and Applied Electrochemistry

DOI: 10.3103/s1068375525700036

Authors: R. R. Kabulov, A. Kutlimratov, A. S. Saidov, M. U. Khajiev, Kh. N. Juraev

Institutions: Academy of Sciences Republic of Uzbekistan, Physicotechnical Institute, Tashkent Institute of Irrigation and Agricultural Mechanization Engineers

Language: English

Topic: ZnO doping and properties

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411178647

FWCI: 0.626

Cites: 22

Cited by: 3

Related to: 10