Identifying the Role of the TMA/H2O Atomic Layer Deposition Process on NMC811 Electrochemical Performance
Year: 2025
Type: article
Source: ACS Applied Energy Materials
Institutions: University of Colorado Boulder, Forge Nano (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G4843858907
OpenAlex ID: W4411198491
