Work

Assessment of Advanced Non-Volatile Fefet Memories Based on Hafnium-Oxide

Year: 2024

Type: conference-paper

Source: RADECS Data Workshop

DOI: 10.1109/radecs61975.2024.11017569

Authors: Michael Steffens, Stefan Slesazeck, Viktor Havel, Markus Plattner

Institutions: Fraunhofer Institute for Technological Trend Analysis, NaMLab (Germany)

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411205148

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