Work

Generalized method for optimizing impedance matching in capacitively coupled plasmas

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004630

Authors: Dehen Cao, Shimin Yu, Hongyu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang

Institutions: Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Anshan Normal University, Wuhan University of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G3658540377, G6680748996, G7778691778

OpenAlex ID: W4411211975

FWCI: 0.683

Cites: 60

Cited by: 3

Related to: 10