Work

Nitride ferroelectric films deposited in capacitor structures for high-temperature memory

Year: 2025
Type: article
Abstract: Approach highlights methods for using lower-cost molybdenum electrodes and the impact of oxygen on impeding electrical pathways.
Source: Scilight
Language: English
Open Access status: bronze
OpenAlex ID: W4411215461
FWCI:
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Related to: 10