Work

Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists

Year: 2025

Type: article

Abstract: n-CARs based on aryl sulfonate ester-functionalized polystyrenes gave an impressive 18 nm L/S and 10 nm L/4S EBL patterns, highlighting the effect of substituents on the lithographic performance of the n-CARs.

Source: Industrial Chemistry and Materials

DOI: 10.1039/d5im00046g

Authors: Rongrong Peng, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Guoqiang Yang, Yi Li

Institutions: Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, Institute of Chemistry, Shanghai Synchrotron Radiation Facility

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences

Awards: G6004853180, G7368391619

OpenAlex ID: W4411239445

FWCI: 1.847

Cites: 48

Cited by: 8

Related to: 10