Work

Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation Interconnects

Year: 2025

Type: article

Source: ACS Applied Nano Materials

DOI: 10.1021/acsanm.5c02365

Authors: Min-Ji Ha, Na-Gyeong Kang, Eun-Su Chung, Ji-Hoon Ahn

Institution: Hanyang University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Science and ICT, South Korea

Award: G8200975697

OpenAlex ID: W4411261808

FWCI: 0.815

Cites: 18

Cited by: 5

Related to: 10