Work

The Modeling of Post-Annealing and Etching Processes of ALD SiO₂ Using Intermediate Variables Considering Digital Twin Model Reusability

Year: 2025

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2025.3579474

Authors: Ryosuke Okachi, Masanori Usui, Tomohiko Mori, Junya Muramatsu, Makoto Kuwahara, Daigo Kikuta

Institution: Toyota Central Research and Development Laboratories (Japan)

Language: English

Topic: Digital Transformation in Industry

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4411270957

FWCI: 0.519

Cites: 9

Cited by: 1

Related to: 10