Work

Determining the Technological Window for High-Aspect X-ray Lithography

Year: 2024

Type: article

Source: Inorganic Materials Applied Research

DOI: 10.1134/s2075113325700224

Authors: A. N. Gentselev, A. V. Varand

Institutions: Russian Academy of Sciences, Siberian Branch of the Russian Academy of Sciences, Budker Institute of Nuclear Physics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411276796

FWCI: 0.104

Cites: 16

Cited by: 1

Related to: 10