Work

Electron-Enhanced Deposition of Titanium-, Silicon- and Tungsten-Containing Films at Low Temperatures Using Volatile Precursors with Various Reactive Background Gases

Year: 2025

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.5c00264

Authors: Zachary C. Sobell, Andrew S. Cavanagh, Steven M. George

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Semiconductor Research Corporation

OpenAlex ID: W4411329583

FWCI: 0.462

Cites: 70

Cited by: 2

Related to: 10